Nanostructure die, embossing roll, device and method for continuous embossing of nanostructures
US9764511B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2011 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Sep 10, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2059/023
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A nanostructure die with a concavely curved nanostructured die surface for seamless embossing of at least one peripheral ring of a jacket surface of an embossing roll in a step-and-repeat process and an embossing roll for continuous embossing of nanostructures with an embossing layer, which has been applied on a body of revolution, with a jacket surface with at least one peripheral ring which is made seamless at least in the peripheral direction and which is embossed in the step-and-repeat process. Furthermore, the invention relates to a method and a device for producing such an embossing roll for continuous embossing of nanostructures as well as a method for producing such a nanostructure die and a method for producing an embossing substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.