Radiation source-collector and method for manufacture
US9773578B2 · kind B2 · utility
1Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2014 |
| Grant date | Sep 26, 2017 |
| Priority date | — |
| Expiry date | Jan 14, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.