Apparatus for variable substrate temperature control

US9783889B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Gwo-Chuan Tzu · Sunnyvale, US
• Xiaoxiong Yuan · Cupertino, US
• Amit Khandelwal · Cupertino, US
• Avgerinos V. Gelatos · Scotts Valley, US
• Olkan Cuvalci · Sunnyvale, US
• Kai Wu · Palo Alto, US
• Michael P. Karazim · San Jose, US

Key dates

• Filing date: Mar 26, 2012
• Grant date: Oct 10, 2017
• Expiry date: Jun 7, 2036

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/52
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In some embodiments, an apparatus for variable substrate temperature control may include a heater moveable along a central axis of a substrate support; a seal ring disposed about the heater, the seal ring configured to interface with a shadow ring disposed above the heater to form a seal; a plurality of spacer pins configured to support a substrate and disposed within a plurality of through holes formed in the heater, the plurality of spacer pins moveable parallel to the central axis, wherein the plurality of spacer pins control a first distance between the substrate and the heater and a second distance between the substrate and the shadow ring; and a resilient element disposed beneath the seal ring to bias the seal ring toward a backside surface of the heater.