Assembly for a projection exposure apparatus for EUV projection lithography

US9791784B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Michael Patra · Oberkochen, DE
• Stig Bieling · Aalen, DE
• Markus Deguenther · Aalen, DE
• Johannes Wangler · Oberkochen, DE

Key dates

• Filing date: Oct 16, 2014
• Grant date: Oct 17, 2017
• Expiry date: Dec 13, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70116
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An assembly for a projection exposure apparatus for EUV projection lithography has an illumination optical unit for guiding illumination light to an illumination field, in which a lithography mask can be arranged. The illumination optical unit comprises a first facet mirror, which comprises a plurality of mirror arrays with respectively a plurality of individual mirrors. The individual mirrors provide individual mirror illumination channels for guiding illumination light partial beams to the illumination field. The mirror arrays of the first facet mirror are arranged in an array superstructure. Gaps extend along at least one main direction (HRα) between neighboring ones of the mirror arrays. Furthermore, the illumination optical unit comprises a second facet mirror, which comprises a plurality of facets, which respectively contribute to imaging a group of the individual mirrors of the field facet mirror into the illumination field via a group mirror illumination channel.