Systems and methods for using multiple inductive and capacitive fixtures for applying a variety of plasma conditions to determine a match network model
US9831071B2 · kind B2 · utility
9Cited by
29References
18Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 3, 2016 |
| Grant date | Nov 28, 2017 |
| Priority date | — |
| Expiry date | Mar 11, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R27/04
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods for using multiple inductive and capacitive fixtures for applying a variety of plasma conditions to determine fixed parameters of a match network model are described. The multiple fixtures mimic various plasma conditions without occupying tool time in which a wafer is placed within a plasma chamber to generate the fixed parameters of the match network model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.