Bipolar collimator utilized in a physical vapor deposition chamber
US9831074B2 · kind B2 · utility
3Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2013 |
| Grant date | Nov 28, 2017 |
| Priority date | — |
| Expiry date | Oct 25, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3426
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides an apparatus including a bipolar collimator disposed in a physical vapor deposition chamber and methods of using the same. In one embodiment, an apparatus includes a chamber body and a chamber lid disposed on the chamber body defining a processing region therein, a collimator disposed in the processing region, and a power source coupled to the collimator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.