Absorbing reflector for semiconductor processing chamber

US9832816B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Kin Pong Lo · Fremont, US
• Paul Brillhart · Pleasanton, US
• Balasubramanian Ramachandran · Santa Clara, US
• Satheesh Kuppurao · San Jose, US
• Daniel Redfield · معلمی نژاد, US
• Joseph M. Ranish · San Jose, US
• James Francis Mack · Palo Alto, US
• Kailash Kiran Patalay · Santa Clara, US
• Michael Olsen · Merrill, US
• Eddie Feigel · Forest Grove, US
• Richard Halpin · Hillsboro, US
• Brett Vetorino · Austin, US

Key dates

• Filing date: Apr 22, 2014
• Grant date: Nov 28, 2017
• Expiry date: Mar 15, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67115
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.