Inventor · معلمی نژاد, CA, US

Daniel Redfield

49Patents
15h-index
53Co-inventors
76Inventor score

Filing activity: Apr 22, 2014 → Sep 16, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US9873180B2 CMP pad construction with composite material properties using additive manufacturing processes Performing Operations; Transporting 37 Active
US10384330B2 Polishing pads produced by an additive manufacturing process Performing Operations; Transporting 20 Active
US10456886B2 Porous chemical mechanical polishing pads Performing Operations; Transporting 20 Active
US9776361B2 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles Performing Operations; Transporting 20 Active
US10399201B2 Advanced polishing pads having compositional gradients by use of an additive manufacturing process Performing Operations; Transporting 20 Active
US10593574B2 Techniques for combining CMP process tracking data with 3D printed CMP consumables Electricity 17 Active
US10391605B2 Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process Performing Operations; Transporting 17 Active
US10618141B2 Apparatus for forming a polishing article that has a desired zeta potential Electricity 17 Active
US10537974B2 CMP pad construction with composite material properties using additive manufacturing processes Performing Operations; Transporting 16 Active
US10875145B2 Polishing pads produced by an additive manufacturing process Performing Operations; Transporting 16 Active
US10821573B2 Polishing pads produced by an additive manufacturing process Performing Operations; Transporting 16 Active
US10919123B2 Piezo-electric end-pointing for 3D printed CMP pads Electricity 15 Active
US10322491B2 Printed chemical mechanical polishing pad Performing Operations; Transporting 15 Active
US10875153B2 Advanced polishing pad materials and formulations Performing Operations; Transporting 15 Active
US10773509B2 Pad structure and fabrication methods Performing Operations; Transporting 15 Active
US10953515B2 Apparatus and method of forming a polishing pads by use of an additive manufacturing process Performing Operations; Transporting 15 Active
US10493691B2 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles Performing Operations; Transporting 15 Active
US11745302B2 Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process Performing Operations; Transporting 3 Active
US10882160B2 Correction of fabricated shapes in additive manufacturing using sacrificial material Performing Operations; Transporting 3 Active
US11724362B2 Polishing pads produced by an additive manufacturing process Performing Operations; Transporting 3 Active
US10589399B2 Textured small pad for chemical mechanical polishing Performing Operations; Transporting 2 Active
US10537973B2 Correction of fabricated shapes in additive manufacturing Performing Operations; Transporting 1 Active
US9832816B2 Absorbing reflector for semiconductor processing chamber Electricity 1 Active
US11446788B2 Precursor formulations for polishing pads produced by an additive manufacturing process Performing Operations; Transporting 1 Active
US11154961B2 Correction of fabricated shapes in additive manufacturing Performing Operations; Transporting 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.