Process kit shield for improved particle reduction
US9834840B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 12, 2011 |
| Grant date | Dec 5, 2017 |
| Priority date | — |
| Expiry date | Aug 18, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3411
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus for improved particle reduction are provided herein. In some embodiments, an apparatus may include a process kit shield comprising a one-piece metal body having an upper portion and a lower portion and having an opening disposed through the one-piece metal body, wherein the upper portion includes an opening-facing surface configured to be disposed about and spaced apart from a target of a physical vapor deposition chamber and wherein the opening-facing surface is configured to limit particle deposition on an upper surface of the upper portion of the one-piece metal body during sputtering of a target material from the target of the physical vapor deposition chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.