Substrate liquid processing apparatus, exhaust switching unit and substrate liquid processing method
US9842747B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2015 |
| Grant date | Dec 12, 2017 |
| Priority date | — |
| Expiry date | Mar 15, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate liquid processing apparatus includes a liquid processing unit that processes a substrate with processing liquids, an exhaust pipe, individual exhaust pipes corresponding to at least one of the processing liquids and an exhaust switching unit. Further, the exhaust switching unit comprises an exhaust gas inlet chamber and switching mechanisms. The switching mechanisms correspond to the individual exhaust pipes, respectively, and each of the switching mechanisms includes an exhaust gas suction opening communicating with the exhaust gas inlet chamber; an outlet opening communicating with a corresponding one of the individual exhaust pipes; an exterior air suction opening; and a valve body that switches a communication state of the exhaust gas suction opening, the outlet opening and the exterior air suction opening between a state where the exhaust gas suction opening communicates with the outlet opening and a state where the exterior air suction opening communicates therewith.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.