Measuring method, measurement apparatus, lithographic apparatus and device manufacturing method
US9891540B2 · kind B2 · utility
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4References
24Claims
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Key dates
| Filing date | May 29, 2015 |
| Grant date | Feb 13, 2018 |
| Priority date | — |
| Expiry date | May 29, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.