Patent · US Active

Multi-zone resistive heater

US9892941B2 · kind B2 · utility

1Cited by

13References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Anqing Cui · Palo Alto, US
Binh Tran · San Jose, US
Alexander Tam · Union City, US
Jacob Smith · Santa Clara, US
R. Suryanarayanan Iyer · Santa Clara, US
Joseph Yudovsky · Campbell, US
Sean M. Seutter · Fremont, US

Key dates

Filing date	Jun 16, 2009
Grant date	Feb 13, 2018
Priority date	—
Expiry date	May 2, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH05B3/68
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.