Method for protecting layer by forming hydrocarbon-based extremely thin film
US9899291B2 · kind B2 · utility
447Cited by
646References
16Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 13, 2015 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Oct 15, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/324
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for protecting a layer includes: providing a substrate having a target layer and forming a protective layer on the target layer, said protective layer contacting and covering the target layer and containing a hydrocarbon-based layer constituting at least an upper part of the protective layer, which hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.