Oxidized showerhead and process kit parts and methods of using same
US9914999B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2015 |
| Grant date | Mar 13, 2018 |
| Priority date | — |
| Expiry date | Mar 4, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45565
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and apparatus for processing a substrate are provided herein. In some embodiments, a process chamber includes: a chamber body and a lid assembly defining a processing volume within the process chamber; a substrate support disposed within the processing volume to support a substrate; and a showerhead having a first surface including a plurality of gas distribution holes disposed opposite and parallel to the substrate support, wherein the showerhead is fabricated from aluminum and includes an aluminum oxide coating along the first surface, wherein the aluminum oxide coating has a thickness of about 0.0001 to about 0.002 inches. In some embodiments, the showerhead may further have at least one of a roughness of about 10 to about 300 μ-in Ra, or an emissivity (∈) of about 0.20 to about 0.80. The process chamber may be a thermal atomic layer deposition (ALD) chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.