Technique for measuring overlay between layers of a multilayer structure
US9916652B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 26, 2016 |
| Grant date | Mar 13, 2018 |
| Priority date | — |
| Expiry date | Dec 26, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.