Patent · US Active

Apparatus for PVD dielectric deposition

US9928997B2 · kind B2 · utility

1Cited by

3References

18Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Keith A. Miller · Schererville, US
Thanh X. Nguyen · San Jose, US
Ilya Lavitsky · San Francisco, US
Randy D. Schmieding · Saratoga, US
Prashanth Kothnur · San Jose, US

Key dates

Filing date	Feb 9, 2015
Grant date	Mar 27, 2018
Priority date	—
Expiry date	Sep 18, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3467
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.