System and method to detect substrate and/or substrate support misalignment using imaging
US9959610B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 13, 2015 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Dec 11, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for detecting substrate misalignment (i.e., position displacement error) and/or substrate support misalignment. According to certain aspects, a method for detecting a misalignment of an object in a processing system is provided. The method generally includes obtaining a first image of the object, determining first values associated with pixels in at least one region of the first image, calculating at least one of a center of gravity value of the pixels in the at least one region or an average weight of the pixels in the at least one region, and detecting a misalignment of the object based on at least one of the calculated center of gravity or average weight of the pixels in the at least one region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.