Patent · US Active

Magnetron assembly for physical vapor deposition chamber

US9991101B2 · kind B2 · utility

2Cited by

3References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

William Johanson · Gilroy, US
Brij Datta · Detroit, US
Fuhong Zhang · San Jose, US
Adolph Miller Allen · Oakland, US
Yu Liu · Campbell, US
Prashanth Kothnur · San Jose, US

Key dates

Filing date	May 29, 2015
Grant date	Jun 5, 2018
Priority date	—
Expiry date	May 6, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3461
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Methods and apparatus for a magnetron assembly are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis and rotatable about the central axis, a closed loop magnetic pole coupled to a first surface of the shunt plate and disposed 360 degrees along a peripheral edge of the shunt plate, and an open loop magnetic pole coupled at a the first surface of the shunt plate wherein the open loop magnetic pole comprises two rows of magnets disposed about the central axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.