Electrostatic chuck with improved spacing and charge migration reduction mask
USD407073S · kind S · design
15Cited by
6References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 24, 1997 |
| Grant date | Mar 23, 1999 |
| Priority date | — |
| Expiry date | Mar 23, 2013 |
Classification
- Technology area (CPC —)General
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.