Electrostatic chuck with improved spacing and charge migration reduction mask
USD420022S · kind S · design
25Cited by
1References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 24, 1997 |
| Grant date | Feb 1, 2000 |
| Priority date | — |
| Expiry date | Feb 1, 2014 |
Classification
- Technology area (CPC —)General
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.