Guard ring electrostatic chuck
USRE37580E1 · kind E1 · reissue
26Cited by
7References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1999 |
| Grant date | Mar 12, 2002 |
| Priority date | — |
| Expiry date | Mar 18, 2019 |
Classification
- Technology area (CPC —)General
Abstract
An electrostatic chuck is disclosed that is resistant to the formation of vacuum arcs between the back of the wafer being processed and the body of the chuck. A guard ring surrounds the chuck and floats close to the self-bias potential induced by the plasma on the wafer. The voltage between the wafer and the closest electrode is thereby capacitively divided by the guard ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.