Inspection method and apparatus and lithographic processing cell
USRE49199E1 · kind E1 · reissue
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Key dates
| Filing date | Feb 23, 2015 |
| Grant date | Sep 6, 2022 |
| Priority date | — |
| Expiry date | Feb 23, 2035 |
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- Technology area (CPC —)General
Abstract
A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.
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