Charm Engineering Co., Ltd.
4Patents
4Active
4Granted
46Portfolio score
Filing activity: Mar 13, 2008 → Apr 6, 2009 · 4 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8373086B2 | Plasma processing apparatus and method for plasma processing | Electricity | 8 | Active |
| US8888950B2 | Apparatus for plasma processing and method for plasma processing | Electricity | 7 | Active |
| US8980049B2 | Apparatus for supporting substrate and plasma etching apparatus having the same | Electricity | 6 | Active |
| US8864936B2 | Apparatus and method for processing substrate | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.