Pallidus, Inc.
15Patents
15Active
15Granted
53Portfolio score
Filing activity: Sep 24, 2015 → Jun 19, 2022
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10322974B2 | Pressed and self sintered polymer derived SiC materials, applications and devices | Chemistry; Metallurgy | 3 | Active |
| US10322936B2 | High purity polysilocarb materials, applications and processes | Emerging Cross-Sectional Technologies | 2 | Active |
| US10753010B2 | Vapor deposition apparatus and techniques using high puritiy polymer derived silicon carbide | Chemistry; Metallurgy | 2 | Active |
| US12215031B2 | High purity polysilocarb derived silicon carbide powder | Electricity | 0 | Active |
| US11091370B2 | Polysilocarb based silicon carbide materials, applications and devices | Chemistry; Metallurgy | 0 | Active |
| US11820666B2 | Polysilocarb based silicon carbide materials, applications and devices | Chemistry; Metallurgy | 0 | Active |
| US10597794B2 | High purity polymer derived 3C SiC, methods compositions and applications | Chemistry; Metallurgy | 0 | Active |
| US11685660B2 | Vapor deposition apparatus and techniques using high purity polymer derived silicon carbide | Chemistry; Metallurgy | 0 | Active |
| US12330948B2 | SiC volumetric shapes and methods of forming boules | Chemistry; Metallurgy | 0 | Active |
| US12030819B2 | Doped SiC and SiOC compositions and Methods | Chemistry; Metallurgy | 0 | Active |
| US12151940B2 | High purity polysilocarb materials, applications and processes | Emerging Cross-Sectional Technologies | 0 | Active |
| US11365124B2 | High purity SiOC and SiC, methods compositions and applications | Chemistry; Metallurgy | 0 | Active |
| US11053167B2 | Pressed and self sintered polymer derived SiC materials, applications and devices | Chemistry; Metallurgy | 0 | Active |
| US12291456B2 | High purity SiOC and SiC, methods compositions and applications | Chemistry; Metallurgy | 0 | Active |
| US11014819B2 | Methods of providing high purity SiOC and SiC materials | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.