Peter Wolters GmbH
13Patents
8Active
13Granted
44Portfolio score
Filing activity: Sep 8, 1988 → May 18, 2010 · 6 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5205077A | Apparatus for controlling operation of a lapping, honing or polishing machine | Performing Operations; Transporting | 112 | Expired |
| US4916868A | Honing, lapping or polishing machine | Performing Operations; Transporting | 25 | Expired |
| US7367867B2 | Two-side working machine | Performing Operations; Transporting | 24 | Active |
| US4962616A | Method and device for controlling the operation of honing machines | Performing Operations; Transporting | 15 | Expired |
| US8113913B2 | Method for the simultaneous grinding of a plurality of semiconductor wafers | Performing Operations; Transporting | 11 | Active |
| US7815489B2 | Method for the simultaneous double-side grinding of a plurality of semiconductor wafers | Performing Operations; Transporting | 7 | Active |
| US7963823B2 | Machining machine with means for acquiring machining parameters | Emerging Cross-Sectional Technologies | 7 | Active |
| US5067203A | Card clothing | Textiles; Paper | 3 | Expired |
| US9539695B2 | Carrier, method for coating a carrier, and method for the simultaneous double-side material-removing machining of semiconductor wafers | Emerging Cross-Sectional Technologies | 2 | Active |
| US8951096B2 | Method for machining flat workpieces | Physics | 2 | Active |
| US9004981B2 | Apparatus for double-sided, grinding machining of flat workpieces | Performing Operations; Transporting | 1 | Active |
| US8512099B2 | Method for the simultaneous double-sided material removal processing of a plurality of semiconductor wafers | Performing Operations; Transporting | 1 | Active |
| US5008979A | Textile-fiber treating grooved roller and a wire with teeth having a foot portion indented for force-fitting the wire into the groove and method of making same | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.