Adauto Diaz
5Patents
2h-index
14Co-inventors
40Inventor score
Filing activity: Apr 18, 2011 → Dec 10, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8992689B2 | Method for removing halogen-containing residues from substrate | Electricity | 8 | Active |
| US8845816B2 | Method extending the service interval of a gas distribution plate | Emerging Cross-Sectional Technologies | 8 | Active |
| US10515862B2 | Wafer based corrosion and time dependent chemical effects | Electricity | 0 | Active |
| US11088000B2 | Wafer based corrosion and time dependent chemical effects | Electricity | 0 | Active |
| US8097088B1 | Methods for processing substrates in a dual chamber processing system having shared resources | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.