Method extending the service interval of a gas distribution plate
US8845816B2 · kind B2 · utility
8Cited by
39References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 29, 2012 |
| Grant date | Sep 30, 2014 |
| Priority date | — |
| Expiry date | Jul 26, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0419
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.