EUV light source

US7164144B2 · kind B2 · utility

Assignee

• Cymer, LLC · US

Inventors

• William N. Partlo · Poway, US
• Norbert Bowering · San Diego, US
• Alexander I. Ershov · Escondido, US
• Igor V. Fomenkov · San Diego, US
• David W. Myers · Poway, US
• Ian Roger Oliver · San Diego, US
• John Viatella · San Diego, US
• Robert N. Jacques · San Diego, US

Key dates

• Filing date: Jul 27, 2004
• Grant date: Jan 16, 2007
• Expiry date: Feb 21, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/067
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.