Reliable modular production quality narrow-band high REP rate excimer laser
US6128323A · kind A · utility
Assignee
Inventors
- David W. Myers
- Herve A. Besaucele
- Palash P. Das
- Thomas Patrick Duffey
- Alexander I. Ershov
- Igor V. Fomenkov
- Thomas Hofmann
- Richard G. Morton
- Richard M. Ness
- Peter Clarke Newman
- Robert G. Ozarski
- Gamaralalage G. Padmabandu
- William N. Partlo
- Daniel A. Rothweil
- Richard L. Sandstrom
- Paul St. Mark Shadforth Thompson
- Richard C. Ujazdowski
- Tom A. Watson
- R. Kyle Webb
- Paolo Zambon
Key dates
| Filing date | Sep 18, 1998 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Sep 18, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2256
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transform…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.