Charles S. Rhoades
10Patents
9h-index
17Co-inventors
61Inventor score
Filing activity: Nov 21, 1991 → Jan 21, 1997
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5545289A | Passivating, stripping and corrosion inhibition of semiconductor substrates | Emerging Cross-Sectional Technologies | 108 | Expired |
| US5486235A | Plasma dry cleaning of semiconductor processing chambers | Emerging Cross-Sectional Technologies | 42 | Expired |
| US5384009A | Plasma etching using xenon | Chemistry; Metallurgy | 38 | Expired |
| US5221424A | Method for removal of photoresist over metal which also removes or inactivates corosion-forming materials remaining from previous metal etch | Electricity | 37 | Expired |
| US5494523A | Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances | Electricity | 34 | Expired |
| US5387556A | Etching aluminum and its alloys using HC1, C1-containing etchant and N.sub. 2 | Electricity | 33 | Expired |
| US5423918A | Method for reducing particulate contamination during plasma processing of semiconductor devices | Electricity | 23 | Expired |
| US5685916A | Dry cleaning of semiconductor processing chambers | Emerging Cross-Sectional Technologies | 16 | Expired |
| US5676759A | Plasma dry cleaning of semiconductor processing chambers | Emerging Cross-Sectional Technologies | 16 | Expired |
| US5753137A | Dry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising material | Emerging Cross-Sectional Technologies | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.