Charles Storey
7Patents
3h-index
9Co-inventors
42Inventor score
Filing activity: Feb 6, 2001 → Jan 3, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6951510B1 | Chemical mechanical polishing pad with grooves alternating between a larger groove size and a smaller groove size | Performing Operations; Transporting | 14 | Expired |
| US6896583B2 | Method and apparatus for conditioning a polishing pad | Performing Operations; Transporting | 11 | Expired |
| US6702654B2 | Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereof | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7527544B2 | System of using offset gage for CMP polishing pad alignment and adjustment | Performing Operations; Transporting | 0 | Active |
| US7033257B2 | Carrier head for chemical mechanical polishing | Performing Operations; Transporting | 0 | Expired |
| US7172496B1 | Method and apparatus for cleaning slurry depositions from a water carrier | Performing Operations; Transporting | 0 | Expired |
| US7338569B2 | Method and system of using offset gage for CMP polishing pad alignment and adjustment | Performing Operations; Transporting | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.