Da Li
6Patents
2h-index
28Co-inventors
47Inventor score
Filing activity: Sep 19, 2012 → Oct 26, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11314168B2 | Underlayer for photoresist adhesion and dose reduction | Electricity | 12 | Active |
| US12105422B2 | Photoresist development with halide chemistries | Electricity | 4 | Active |
| US11988965B2 | Underlayer for photoresist adhesion and dose reduction | Electricity | 2 | Active |
| US9559295B2 | Nano multilayer film, field effect tube, sensor, random accessory memory and preparation method | Electricity | 2 | Active |
| US12062538B2 | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement | Electricity | 2 | Active |
| US12027375B2 | Selective etch using a sacrificial mask | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.