Stop, optical system and lithography apparatus

US12222655B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Benjahman Julius Modeste · Oberelchingen, DE
• Toralf Gruner · Hennef (Sieg), DE
• Daniel Golde · Oberkochen, DE
• Ulrich Loering · Schwäbisch Gmünd, DE
• Ralf Zweering · Aalen, DE
• Stefan Xalter · Oberkochen, DE

Key dates

• Filing date: Dec 17, 2021
• Grant date: Feb 11, 2025
• Expiry date: Dec 20, 2042

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B17/0892
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.