Daniel Moser
6Patents
1h-index
19Co-inventors
48Inventor score
Filing activity: Sep 27, 2001 → Dec 6, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8728955B2 | Method of plasma activated deposition of a conformal film on a substrate surface | Electricity | 62 | Active |
| US11312730B2 | Metal complexes containing cyclopentadienyl ligands | Electricity | 1 | Active |
| US12297537B2 | Compounds and methods for selectively forming metal-containing films | Electricity | 0 | Active |
| US12180583B2 | Methods of forming low resistivity titanium nitride thin film in horizontal vias and related devices | Electricity | 0 | Active |
| US12286449B2 | Metal complexes containing cyclopentadienyl ligands | Electricity | 0 | Active |
| US6576729B2 | Silylene catalysis of olefin polymerization | Chemistry; Metallurgy | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.