David Krick
4Patents
4h-index
5Co-inventors
43Inventor score
Filing activity: Sep 29, 1995 → Oct 3, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5719085A | Shallow trench isolation technique | Emerging Cross-Sectional Technologies | 397 | Expired |
| US5985735A | Trench isolation process using nitrogen preconditioning to reduce crystal defects | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6118168A | Trench isolation process using nitrogen preconditioning to reduce crystal defects | Emerging Cross-Sectional Technologies | 19 | Expired |
| US7504185B2 | Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography | Physics | 4 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.