Edwin Te Sligte
7Patents
1h-index
46Co-inventors
47Inventor score
Filing activity: Feb 17, 2010 → Dec 24, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10073361B2 | EUV lithography system and operating method | Physics | 4 | Active |
| US8980009B2 | Method for removing a contamination layer from an optical surface and arrangement therefor | Physics | 0 | Active |
| US11048180B2 | Component for use in a patterning device environment | Physics | 0 | Active |
| US12332570B2 | Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris | Physics | 0 | Active |
| US11199363B2 | Method for removing a contamination layer by an atomic layer etching process | Emerging Cross-Sectional Technologies | 0 | Active |
| US9161427B2 | Device and method for generating a plasma discharge for patterning the surface of a substrate | Electricity | 0 | Active |
| US10690812B2 | Optical element and optical system for EUV lithography, and method for treating such an optical element | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.