Component for use in a patterning device environment
US11048180B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Sep 16, 2019 |
| Grant date | Jun 29, 2021 |
| Priority date | — |
| Expiry date | Sep 16, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70958
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.