Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris
US12332570B2 · kind B2 · utility
0Cited by
7References
15Claims
0Family size
Assignees
Inventors
- Ronald Peter Albright
- Kursat Bal
- Vadim Yevgenyevich Banine
- Richard Joseph Bruls
- Sjoerd Frans DE VRIES
- Olav Waldemar Vladimir Frijns
- Yang-Shan Huang
- Zhuangxiong HUANG
- Johannes Henricus Wilhelmus Jacobs
- Johannes Hubertus Josephina Moors
- Georgi Nenchev Nenchev
- Andrey Nikipelov
- Thomas Maarten Raasveld
- Manish Ranjan
- Edwin Te Sligte
- Karl R. Umstadter
- Eray Uzgören
- Marcus Adrianus Van De Kerkhof
- Parham Yaghoobi
Key dates
| Filing date | Dec 24, 2020 |
| Grant date | Jun 17, 2025 |
| Priority date | — |
| Expiry date | Apr 24, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70058
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.