Etsuo Wani
5Patents
2h-index
17Co-inventors
48Inventor score
Filing activity: Feb 2, 1984 → Mar 12, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4482419A | Dry etching apparatus comprising etching chambers of different etching rate distributions | Electricity | 35 | Expired |
| US5087341A | Dry etching apparatus and method | Electricity | 10 | Expired |
| US8043438B2 | Device for cleaning CVD device and method of cleaning CVD device | Chemistry; Metallurgy | 2 | Expired |
| US6935351B2 | Method of cleaning CVD device and cleaning device therefor | Emerging Cross-Sectional Technologies | 1 | Expired |
| US8277560B2 | CVD apparatus and method of cleaning the CVD apparatus | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.