Fumitaka Shoji
4Patents
3h-index
4Co-inventors
39Inventor score
Filing activity: Jul 15, 2011 → Sep 26, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9018093B2 | Method for forming layer constituted by repeated stacked layers | Electricity | 502 | Active |
| US9365924B2 | Method for forming film by plasma-assisted deposition using two-frequency combined pulsed RF power | Electricity | 447 | Active |
| US10854498B2 | Wafer-supporting device and method for producing same | Chemistry; Metallurgy | 3 | Active |
| US10734219B2 | Plasma film forming method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.