Gary Shen
11Patents
6h-index
17Co-inventors
63Inventor score
Filing activity: Feb 22, 1990 → Jun 9, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7923321B2 | Method for gap filling in a gate last process | Electricity | 60 | Active |
| US6081120A | Universal-multi-layered, multi-tuned RF probe for MRI and MRS | Physics | 47 | Expired |
| US7985690B2 | Method for a gate last process | Electricity | 12 | Active |
| US8286114B2 | 3-dimensional device design layout | Electricity | 11 | Active |
| US7981801B2 | Chemical mechanical polishing (CMP) method for gate last process | Emerging Cross-Sectional Technologies | 10 | Active |
| US8349680B2 | High-k metal gate CMOS patterning method | Electricity | 9 | Active |
| US5036426A | Method and apparatus for tuning and matching an NMR coil | Electricity | 6 | Expired |
| US8390072B2 | Chemical mechanical polishing (CMP) method for gate last process | Emerging Cross-Sectional Technologies | 5 | Active |
| US7732516B2 | Flame retardant polyimide/polyester-polycarbonate compositions, methods of manufacture, and articles formed therefrom | Chemistry; Metallurgy | 4 | Active |
| US8598630B2 | Photo alignment mark for a gate last process | Electricity | 2 | Active |
| US9054025B2 | Process for controlling shallow trench isolation step height | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.