Ichiro Ishikawa
11Patents
2h-index
13Co-inventors
51Inventor score
Filing activity: Aug 18, 1989 → Feb 16, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4946417A | Running toy shooting apparatus | Human Necessities | 20 | Expired |
| US6608675B1 | Method for visualizing higher-order structure of transparent optical polymer molding | Physics | 5 | Expired |
| US11914284B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Physics | 2 | Active |
| US9243855B2 | Cooling structure, vortex-flow forming plate molding apparatus, and method for molding vortex-flow generating portion | Emerging Cross-Sectional Technologies | 2 | Active |
| US11829065B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Physics | 1 | Active |
| US12125620B2 | Electromagnetic steel sheet | Emerging Cross-Sectional Technologies | 0 | Active |
| US12222640B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Physics | 0 | Active |
| US12204240B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Physics | 0 | Active |
| US12105412B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Chemistry; Metallurgy | 0 | Active |
| US12216397B2 | Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof | Electricity | 0 | Active |
| US11822229B2 | Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.