Jeng-Wei Yu
21Patents
2h-index
22Co-inventors
57Inventor score
Filing activity: Sep 19, 2003 → Feb 19, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8409892B2 | Method of selective photo-enhanced wet oxidation for nitride layer regrowth on substrates | Electricity | 5 | Active |
| US11101347B2 | Confined source/drain epitaxy regions and method forming same | Electricity | 4 | Active |
| US10546784B2 | Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same | Electricity | 2 | Active |
| US11948971B2 | Confined source/drain epitaxy regions and method forming same | Electricity | 1 | Active |
| US8809832B1 | Method of selective photo-enhanced wet oxidation for nitride layer regrowth on substrates and associated structure | Electricity | 1 | Active |
| US11037826B2 | Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same | Electricity | 1 | Active |
| US11908742B2 | Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same | Electricity | 0 | Active |
| US8871546B2 | Method of selective photo-enhanced wet oxidation for nitride layer regrowth on substrates and associated structure | Electricity | 0 | Active |
| US7001784B2 | Method to control spacer width | Electricity | 0 | Expired |
| US12068395B2 | Method for forming an undoped region under a source/drain | Electricity | 0 | Active |
| US8487325B2 | Light emitting diode with large viewing angle and fabricating method thereof | Electricity | 0 | Active |
| US12363993B2 | Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same | Electricity | 0 | Active |
| US11652105B2 | Epitaxy regions with large landing areas for contact plugs | Electricity | 0 | Active |
| US12389649B2 | Transistors with stacked semiconductor layers as channels | Electricity | 0 | Active |
| US8679883B2 | Method of separating nitride films from growth substrates by selective photo-enhanced wet oxidation and associated semiconductor structure | Electricity | 0 | Active |
| US12094778B2 | Fin field-effect transistor device and method of forming | Electricity | 0 | Active |
| US11257908B2 | Transistors with stacked semiconductor layers as channels | Electricity | 0 | Active |
| US12057450B2 | Epitaxy regions with large landing areas for contact plugs | Electricity | 0 | Active |
| US8481353B2 | Method of separating nitride films from the growth substrates by selective photo-enhanced wet oxidation | Electricity | 0 | Active |
| US10879128B2 | Semiconductor device and method of forming same | Electricity | 0 | Active |
| US10049936B2 | Semiconductor device having merged epitaxial features with Arc-like bottom surface and method of making the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.