Jonathan Alan Orth
7Patents
4h-index
4Co-inventors
42Inventor score
Filing activity: Sep 16, 1994 → Sep 13, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6222936A | Apparatus and method for reducing defects in a semiconductor lithographic process | Physics | 63 | Expired |
| US5985497A | Method for reducing defects in a semiconductor lithographic process | Physics | 57 | Expired |
| US5750317A | Process and system for flattening secondary edgebeads on resist coated wafers | Physics | 6 | Expired |
| US5874202A | Process and system for flattening secondary edgebeads on resist coated wafers | Physics | 5 | Expired |
| US6001542A | Process and system for flattening secondary edgebeads on resist coated wafers | Physics | 4 | Expired |
| US5911090A | Process and system for flattening secondary edgebeads on resist coated wafers | Physics | 2 | Expired |
| US6184156A | Process and system for flattening secondary edgebeads on resist coated wafers | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.