Method for producing an illumination system for an EUV projection exposure system, and illumination system

US11048172B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Juergen Baier · Oberkochen, DE
• Daniel Runde · Satteldorf, DE
• Matthias Manger · Neukochen, DE
• Ulrich Mueller · Hamburg, DE
• Joerg Lichtenthaeler · Aalen, DE
• André Orthen · Oberkochen, DE
• Joachim Welker · Heidenheim, DE
• Markus Holz · Aalen, DE
• Hubert Holderer · Oberkochen, DE

Key dates

• Filing date: Dec 5, 2019
• Grant date: Jun 29, 2021
• Expiry date: Dec 5, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7085
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.