Keung Hui
11Patents
3h-index
14Co-inventors
49Inventor score
Filing activity: Oct 13, 2008 → Aug 10, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8309444B2 | System and method of dosage profile control | Electricity | 7 | Active |
| US8295965B2 | Semiconductor processing dispatch control | Emerging Cross-Sectional Technologies | 7 | Active |
| US9102033B2 | Apparatus and method for target thickness and surface profile uniformity control of multi-head chemical mechanical polishing process | Electricity | 4 | Active |
| US9158301B2 | Semiconductor processing dispatch control | Emerging Cross-Sectional Technologies | 3 | Active |
| US10096482B2 | Apparatus and method for chemical mechanical polishing process control | Electricity | 1 | Active |
| US9132523B2 | Chemical mechanical polish process control for improvement in within-wafer thickness uniformity | Performing Operations; Transporting | 1 | Active |
| US8781614B2 | Semiconductor processing dispatch control | Emerging Cross-Sectional Technologies | 1 | Active |
| US9323244B2 | Semiconductor fabrication component retuning | Emerging Cross-Sectional Technologies | 0 | Active |
| US8129279B2 | Chemical mechanical polish process control for improvement in within-wafer thickness uniformity | Performing Operations; Transporting | 0 | Active |
| US8294124B2 | Scanning method and system using 2-D ion implanter | Electricity | 0 | Active |
| US8925479B2 | System and method of dosage profile control | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.