Kirk Strozewski
6Patents
5h-index
17Co-inventors
49Inventor score
Filing activity: May 9, 2002 → Dec 21, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6783904B2 | Lithography correction method and device | Physics | 16 | Expired |
| US7284231B2 | Layout modification using multilayer-based constraints | Physics | 12 | Expired |
| US6858542B2 | Semiconductor fabrication method for making small features | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6838354B2 | Method for forming a passivation layer for air gap formation | Electricity | 11 | Expired |
| US6815820B2 | Method for forming a semiconductor interconnect with multiple thickness | Electricity | 9 | Expired |
| US7176574B2 | Semiconductor device having a multiple thickness interconnect | Electricity | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.