Michael Shifrin
6Patents
1h-index
9Co-inventors
40Inventor score
Filing activity: Dec 29, 2008 → Apr 18, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7803715B1 | Lithographic patterning for sub-90nm with a multi-layered carbon-based hardmask | Electricity | 28 | Active |
| US11309162B2 | TEM-based metrology method and system | Electricity | 0 | Active |
| US11710616B2 | TEM-based metrology method and system | Electricity | 0 | Active |
| US10916404B2 | TEM-based metrology method and system | Electricity | 0 | Active |
| US12057355B2 | Semiconductor device manufacture with in-line hotspot detection | Emerging Cross-Sectional Technologies | 0 | Active |
| US11450541B2 | Metrology method and system | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.