Mieko Suzuki
15Patents
7h-index
10Co-inventors
63Inventor score
Filing activity: Sep 22, 1983 → Mar 28, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5420075A | Forming multi-layered interconnections with fluorine compound treatment permitting selective deposition of insulator | Emerging Cross-Sectional Technologies | 274 | Expired |
| US5607880A | Method of fabricating multilevel interconnections in a semiconductor integrated circuit | Electricity | 30 | Expired |
| US5332694A | Process for manufacturing a semiconductor device | Electricity | 21 | Expired |
| US4552633A | Fine particulate for use in clinical testing and a process for producing thereof | Chemistry; Metallurgy | 17 | Expired |
| US6361708B1 | Method and apparatus for polishing a metal film | Electricity | 10 | Expired |
| US5491108A | Method of producing semiconductor integrated circuit device having interplayer insulating film covering substrate | Electricity | 9 | Expired |
| US6551914B1 | Method of forming polish stop by plasma treatment for interconnection | Electricity | 8 | Expired |
| US6235071A | Chemical mechanical polishing method for highly accurate in-plane uniformity in polishing rate over position | Electricity | 7 | Expired |
| US5904558A | Fabrication process of semiconductor device | Electricity | 7 | Expired |
| US6054383A | Fabrication method of semiconductor device | Electricity | 6 | Expired |
| US6783446B1 | Chemical mechanical polishing apparatus and method of chemical mechanical polishing | Performing Operations; Transporting | 2 | Expired |
| US7123336B2 | Twisted nematic liquid crystal material with certain values for dielectric constant anisotropy, twisted elasticity modulus and refractive index anisotropy | Chemistry; Metallurgy | 1 | Expired |
| US6110014A | Method and apparatus polishing wafer for extended effective area of wafer | Performing Operations; Transporting | 0 | Expired |
| US7167229B2 | Liquid crystal display element and projection display device | Chemistry; Metallurgy | 0 | Expired |
| US6951512B2 | Chemical mechanical polishing apparatus and method of chemical mechanical polishing | Performing Operations; Transporting | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.