Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus

US11328831B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Christian Grasse · Garching bei München, DE
• Martin Hermann · St Helens, AU
• Stephan Six · Aalen, DE
• Joern WEBER · Aalen, DE
• Ralf Winter · Tegernsee, DE
• Oliver Dier · Lauchheim, DE
• Vitaliy Shklover · Heidenheim, DE
• Kerstin Hild · Schwäbisch Gmünd, DE
• Sebastian Strobel · Aalen, DE

Key dates

• Filing date: Jul 31, 2018
• Grant date: May 10, 2022
• Expiry date: Oct 12, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70958
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 μs and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.